Component information
Sputter Source/Sputtering Targets ES-3000 ES-3000U ES-4000 ES-4000U ES-6000 ES-6000U
Overview
This sputter source is suitable for thin film formation of high vapor melting metals and complicated composed alloys. The target is designed for anti thermal damage, and a various kinds of target materials can be used.
Specification Specifications
Product specifications
ES-3000
Target size 3 inch in diameter
Mounting flange CF152mm OD
Shutter No shutter or manual shutter can be selected
Vacuum High vacuum
ES-3000U
Target size 3 inch in diameter
Mounting flange CF152mm OD
Shutter No shutter or manual shutter can be selected
Vacuum Ultra high vacuum
ES-4000
Target size 4 inch in diameter
Mounting flange CF203mm OD
Shutter No shutter or manual shutter can be selected
Vacuum High vacuum
ES-4000U
Target size 4 inch in diameter
Mounting flange CF203mm OD
Shutter No shutter or manual shutter can be selected
Vacuum Ultra high vacuum
ES-6000
Target size 6 inch in diameter
Mounting flange CF253mm OD
Shutter No shutter or manual shutter can be selected
Vacuum High vacuum
ES-6000U
Target size 6 inch in diameter
Mounting flange CF253mm OD
Shutter No shutter or manual shutter can be selected
Vacuum Ultra high vacuum
