Japanese
IB-1

ALD System (Atomic Layer Deposition System)  EALD-4

By adopting the atomic layer deposition method, the EALD-4 regulates the film thickness at one atomic layer le […]

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Electron Microscopy IB-2/IB-3

This apparatus is used for TEM/SEM specimen preparation with ease of operation. By generating a glow discharge […]

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