Selective Sputtering System ESC-333L
- This sputtering system is available for ultra-high vacuum.
- By sliding multiple targets, the required target materials can freely selected to perform sputtering film formation.
- The targets can be selected in a vacuum.
- Multiple targets can be sputtered using a single sputter source.
- The chamber diameter of the system can be structurally reduced, so an affordable price has been achieved.
- The footprint can be reduced.
- Automatic film formation software, substrate transfer software, sputtering source, deposition source, etc. can be installed as optional.