Selective Sputtering System  ESC-333L

This sputtering system is available for ultra-high vacuum. By sliding multiple targets, the required target ma […]

ALD System (Atomic Layer Deposition System)  EALD-4

By adopting the atomic layer deposition method, the EALD-4 regulates the film thickness at one atomic layer le […]

Electron Microscopy IB-2/IB-3

This apparatus is used for TEM/SEM specimen preparation with ease of operation. By generating a glow discharge […]