Selective Sputtering System ESC-333L
This sputtering system is available for ultra-high vacuum. By sliding multiple targets, the required target ma […]
ALD System (Atomic Layer Deposition System) EALD-4
By adopting the atomic layer deposition method, the EALD-4 regulates the film thickness at one atomic layer le […]
Electron Microscopy IB-2/IB-3
This apparatus is used for TEM/SEM specimen preparation with ease of operation. By generating a glow discharge […]