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Component information

Sputter Source/Sputtering Targets   ES-3000 ES-3000U ES-4000 ES-4000U ES-6000 ES-6000U

Overview

This sputter source is suitable for thin film formation of high vapor melting metals and complicated composed alloys. The target is designed for anti thermal damage, and a various kinds of target materials can be used.

Specification Specifications

Product specifications

ES-3000
Target size 3 inch in diameter
Mounting flange CF152mm OD
Shutter No shutter or manual shutter can be selected
Vacuum High vacuum

ES-3000U
Target size 3 inch in diameter
Mounting flange CF152mm OD
Shutter No shutter or manual shutter can be selected
Vacuum Ultra high vacuum

ES-4000
Target size 4 inch in diameter
Mounting flange CF203mm OD
Shutter No shutter or manual shutter can be selected
Vacuum High vacuum

ES-4000U
Target size 4 inch in diameter
Mounting flange CF203mm OD
Shutter No shutter or manual shutter can be selected
Vacuum Ultra high vacuum

ES-6000
Target size 6 inch in diameter
Mounting flange CF253mm OD
Shutter No shutter or manual shutter can be selected
Vacuum High vacuum

ES-6000U
Target size 6 inch in diameter
Mounting flange CF253mm OD
Shutter No shutter or manual shutter can be selected
Vacuum Ultra high vacuum


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