Component information
Electron Beam Evaporation System EWS-200
![](https://en.1974eiko.co.jp/wpeiko/wp-content/uploads/2019/12/EWS-200-300x225.jpg)
Overview
A shutter can be moved under a substrate from a chamber side.
It adopts linear moving method.
Product specifications
1. Stroke:200mm
2. Position accuracy:0.1mm
3. Automated control by pulse motor
4. Driving speed:Variable
5. Interlock