Sputtering sources ES-1000U
The sputter source is designed to be compact, so that it accommodates a target size of 1 inch.
Because the size of the target is small, it is easy to purchase relatively expensive materials for research and development. The ES-1000U can handle a wide variety of targets.
This sputter source is a flange mount type, so maintenance is easy. In addition, it can be used with UHV specifications. Rate stability is achieved during sputter deposition.
1．Target size: 1 inch dia. (25.4 mm dia.)
2. Cooling: method: Water-cooling
3. Mounting flange: 114 mm O.D. CF flange