Vacuum Evaporator VX-20
By simplifying and miniaturizing every part of functions, and combining K cell, electron beam source, or sputter source etc, this apparatus has been developed into processing diverse thin film formation.
1. Ultimate pressure 10-5Pa
2. Vacuum pumps TMP 210L/sec and RP 162L/min Options
3. Substrate holder with heating functions 500ºC maximum
4. Side-entry type k cell Crucible capacity: 1cc max temp.:1300ºC
5. Sputter source 2 inch in diameter