This system is designed for large area substrate such as 300mm x 400mm.
It accommodates 3 pieces of 8 inch sputtering sources.
Distance between target and substrate can adjustably set continuously.
1. Ultimate vacuum pressure: 10-5Pa range
2. Substrate dimensions: 300mm x 400mm
3. Substrate temp: 700ºC maximum
4. Sputter source
5. Target dimensions: 8 inch in diameter
6. Number of target 3 pieces
7. Evacuation Turbo Molecular Pump
8. Thin film forming software