Product information

Sputtering   IB-7


This equipment can use a target (Fe, Ni, Cr, Zr etc.) with a smaller sputter rate than precious metals.

Product specifications

1. Vacuum chamber: 150 dia. x 140 H mm, made of Pyrex glass
2. Ultimate vacuum pressure: 10-3 Pa level
3. Sample size: 50mm dia.
4. Target size: 50mm dia.
5. Pumps: Turbo molecular pump and rotary pump
6. Required electricity: AC100V
7. Target materials: Au, Pt, Pt-Pd, Fe, Ni. Cr, ZnAl